The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Mar. 25, 1999
Applicant:
Inventors:
Markus Strotmann, Hamburg, DE;
Renke Bargmann, Hamburg, DE;
Jorn Leiber, Heiligenstedtenerkamp, DE;
Oliver Selaff, Geesthacht, DE;
Assignee:
Beiersdorf AG, Hamburg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J / ;
U.S. Cl.
CPC ...
427491 ; 4272084 ; 4272088 ; 427244 ; 427294 ; 4274071 ; 427411 ; 427488 ; 427569 ;
Abstract
Process for producing adhesion promoter layers on a material in web form, characterized in that the adhesion promoter layers are applied to the web-form material by means of low-pressure plasma polymerization, the material in web form being guided continuously through a plasma zone in which there is a low-pressure plasma which is generated by electrical discharge, especially kHz, MHz or GHz discharge.