The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Sep. 23, 1998
Applicant:
Inventors:
Yukichi Takamatsu, Kanagawa-ken, JP;
Takeo Yoneyama, Kanagawa-ken, JP;
Yoshiyasu Ishihama, Kanagawa-ken, JP;
Assignee:
Japan Pionics, Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
42725521 ; 42725526 ; 427255391 ; 427255394 ; 4272554 ;
Abstract
A process for preparing a nitride film by a chemical vapor deposition method, which entails reacting a material gas including tert-butyl hydrazene as the main component as the main component of a nitrogen source with a material gas of an organometallic compound, a metal halide or a metal hydride to deposit the nitride film on a substrate.