The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Jun. 23, 1997
Tihiro Ohkawa, La Jolla, CA (US);
Toyo Technologies Inc., La Jolla, CA (US);
Abstract
A device and method for polishing the surface of a substrate uses a vessel for holding a plasma in a magnetic field. Further, the magnetic field is selectively oriented in the vessel relative to the substrate surface. An ion accelerator is then activated to accelerate ions from the plasma on a curved path toward the substrate. By controlling the strength of the magnetic field, and the r-f power and frequency needed to accelerate the ions, the accelerated ions are sent on the curved path for collision with the substrate surface. These collisions, which occur at grazing angles in the range of 0.degree.-20.degree., remove atoms from the substrate surface and thereby polish the surface.