The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Oct. 13, 1998
Toru Saito, Ibaraki-Ken, JP;
Yoshikazu Kumahara, Ibaraki-Ken, JP;
Katsuya Kuboyama, Fukuoka-ken, JP;
Japan Energy Corporation, Tokyo, JP;
Abstract
The present invention provides an ITO sputtering target and a method of cleaning the target. ITO ground powder which is deposited on a surface of the target requires removal to increase the cleanness of the target surface. This prevents the production of nodules caused by sputtering in order to restrain abnormal discharge and prevent the production of particles. Particles deposited on a sputtered surface of an ITO sintered target are removed by subjecting the sputtered surface to multiple-oscillation ultrasonic washing, or alternatively, by sticking an adhesive tape to the sputtered surface, sufficiently rubbing the tape against the surface, and then peeling the tape off the surface. Both methods result in 400 or fewer deposited particles of 0.2 .mu.m or more average particle diameter being present in a 100 .mu.m.times.100 .mu.m area of the sputtered surface.