The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Apr. 16, 1998
Applicant:
Inventors:
Robert Terry, Livermore, CA (US);
Kevin Gibbons, Benicia, CA (US);
Sohrab Zarrabian, Santa Rosa, CA (US);
Assignee:
The BOC Group, Inc., Murray Hill, NJ (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419213 ; 20429801 ; 20429808 ; 20419212 ; 20419215 ;
Abstract
The present invention is a cascade control system for reactive sputtering deposition. A first control loop modifies the power supply in order to keep a monitored value nearly constant. This first control loop can be done relatively quickly. A second control loop monitors a second measure parameter in order to control the reactive gas flow to the system. In a preferred embodiment, the slower control loop is used to maintain a relatively constant power at the power supply.