The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2000

Filed:

Jan. 05, 1998
Applicant:
Inventors:

Do-hyung Kim, Seoul, KR;

Joo-young Lee, Kyungki-do, KR;

Young-so Park, Kyungki-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257296 ; 257905 ; 438634 ; 438740 ; 438970 ;
Abstract

An integrated circuit device includes a substrate, an insulating layer on the substrate, and a plurality of parallel conductive lines on the insulating layer. An etch barrier is on each of the parallel conductive lines wherein each of the etch barriers comprises a layer of silicon nitride on a respective conductive line and wherein each of the etch barriers further comprises a layer of silicon on the silicon nitride layer. In addition, the device includes a plurality of conductive vias through the insulating layer providing electrical connection to respective surface portions of the substrate, wherein each of the conductive vias is provided in the insulating layer between the etch barriers.


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