The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2000
Filed:
May. 11, 1998
Applicant:
Inventors:
Mayur Patel, Darien, IL (US);
Cheng-Sung Huang, Naperville, IL (US);
Robert W Reese, Jr, Glenwood, IL (US);
Jeffrey R Cramm, Batavia, IL (US);
Paul J Harris, Orland Park, IL (US);
Assignee:
Nalco Chemical Company, Naperville, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
526 65 ; 526 64 ; 526240 ; 5263074 ; 5263076 ; 524827 ; 524831 ; 524832 ;
Abstract
A continuous free radical polymerization process for the preparation of water-soluble copolymers from water-soluble monomers for further processing to dry polymers is disclosed. The process allows efficient polymerization of the monomers in aqueous solution in the presence of a free radical catalyst through backmixing. Water-soluble polymers with molecular weights of from about 3,000-30,000,000 and preferably from about 500,000-10,000,000 are obtained utilizing this process.