The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2000
Filed:
Oct. 05, 1998
Wan-Yih Lien, Hsinchu, TW;
Yi-Ping Lee, Taouan, TW;
Vanguard International Semiconductor Corporation, Hsin-Chu, TW;
Abstract
A process for forming a tungsten plug structure, in a contact hole, without recessing of the tungsten plug, or of the adhesive and barrier layers, located on the sides of the contact hole, during the tungsten plug patterning procedure, has been developed. The process features a two stage, in situ RIE procedure, in which a photoresist shape, larger in width than the diameter of the contact hole, is used as a mask to allow patterning of an aluminum based layer, of an underlying tungsten, and of the barrier and adhesive layers. The result of the two stage, in situ RIE procedure is an aluminum based interconnect structure, overlying a tungsten plug structure, with the tungsten plug structure comprised of a tungsten plug, in a contact hole, protected during the patterning procedure by the overlying aluminum based interconnect structure.