The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2000

Filed:

Jan. 05, 1999
Applicant:
Inventors:

Jeong Hwan Son, Taejeon-si, KR;

Young Gwan Kim, Chungcheongbuk-do, KR;

Assignee:

LG Semicon Co., Ltd., Chungcheongbuk-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438217 ; 438302 ; 438919 ;
Abstract

Semiconductor device and method for fabricating the same, is disclosed, which can maintain a threshold voltage constant despite of decreased channel width, the device including a first, and a second conductive type wells in a substrate, a first, and a second gate insulating films on the first, and the second conductive type wells, a first gate electrode on the first gate insulating film, the first gate electrode being doped with a second conductive type except for edges of the first gate electrode in a channel width direction counter doped with a first conductive type, a second gate electrode on the second gate insulating film, the second gate electrode being doped with a first conductive type except for edges of the second gate electrode in a channel width direction counter doped with a second conductive type, and isolating regions formed between the first, and second conductive type wells, the first, and second gate insulating films, and the first, and second gate electrodes.


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