The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2000
Filed:
Mar. 16, 1998
Applicant:
Inventor:
Yukio Tokuda, Kawasaki, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430 30 ; 430 22 ;
Abstract
An exposure method includes holding a reticle fixed, holding a wafer fixed, irradiating the reticle with an exposure beam, projecting an image of the irradicated reticle onto the wafer through a projection optical system, and re-mounting the reticle as the temperature of the reticle reaches or exceeds a predetermined temperature.
Quick Actions:
Tokuda, Yukio. (2000). Exposure method using reticle remount for temperature influence (U.S. Patent No. 6103433). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6103433
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile