The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2000
Filed:
Oct. 15, 1996
Yasuhiro Tanimura, Tokyo, JP;
Koji Ota, Tokyo, JP;
Takesi Sugimoto, Tokyo, JP;
Masao Kawasaki, Tokyo, JP;
Daisyuu Hirayama, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for preventing microorganism multiplication, including using a gas containing a low concentration of ozone and a high concentration of ions, so that the multiplication of microorganisms can be safely and fully prevented by an additive effect of the ozone and ions. The generation of ozone is suppressed by reducing the discharge current in the ionization chamber using a pulse converter, which is provided to control the current flowing at the time of discharge, when generating the ions and ozone in the ionization chamber. Ions are produced in the ionization chamber in a high concentration to produce and supply ionized gas containing a low concentration of ozone and a high concentration of ions, which prevents microorganism multiplication on the objects.