The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2000

Filed:

Sep. 21, 1998
Applicant:
Inventor:

Seok Won Cho, Chungcheongbuk-do, KR;

Assignee:

LG Semicon Co., Ltd., Cheongju-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
257350 ; 438154 ; 438152 ;
Abstract

A multi-layer semiconductor having a semiconductor substrate, a first gate electrode formed over the substrate, first source and drain electrodes in the substrate on both sides of first and second gate electrodes, the second source and drain electrodes connected to the semiconductor layer. The method includes the steps of forming the first gate electrode over the semiconductor substrate with a first insulating layer inbetween, forming the first source and the first drain electrodes in the substrate on both sides of the first gate electrodes, forming a semiconductor layer over the first gate electrode with a second insulating layer therebetween, forming a second gate electrode on the semiconductor layer, and forming second source, and drain electrodes connected to the semiconductor layer.


Find Patent Forward Citations

Cho, Seok. (2000). Multi-layer semiconductor device and method for fabricating the same (U.S. Patent No. 6100566). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6100566

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…