The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2000
Filed:
Aug. 24, 1999
Yoshitomo Nakata, Nishinomiya, JP;
Kazumi Fujioka, Ibo-gun, JP;
Nippon Shokubai Co., Ltd., Osaka, JP;
Abstract
The present invention provides: a cyclic imino ether group containing polymer with an extremely reduced amount of residual cyclic imino ether group containing monomer; and a production process therefor. The cyclic imino ether group containing polymer is obtained by a process including the step of polymerizing a monomer component including a cyclic imino ether group containing monomer, and contains a cyclic imino ether group containing monomer unit in the ratio of not less than 0.1 mol %, wherein the amount of the cyclic imino ether group containing monomer remaining in the polymer is not more than 15 ppm. The production process for a cyclic imino ether group containing polymer comprises the steps of: radical-polymerizing a monomer component including a cyclic imino ether group containing monomer to obtain a cyclic imino ether group containing polymer; devolatilizing the resultant polymer by vacuum heating treatment to remove volatile components from the polymer; and adding a compound, reactable with the cyclic imino ether group, to the polymer in the devolatilizing step.