The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2000
Filed:
Sep. 14, 1998
Neil D McMurdie, Pittsburgh, PA (US);
PPG Industries Ohio, Inc., Cleveland, OH (US);
Abstract
The present invention is a positive acting photoresist composition which includes a positive acting photoactive component and a dimethyl aniline component. The positive acting photoactive component includes at least one positive acting photoactive polymeric compound. The photoactive polymeric compound contains groups having the 2,6-dinitro structure ##STR1## or a 2,5-dinitro structure ##STR2## where X and Y may be the same or different member selected from the group consisting of: halogen, --OR, --O--SO.sub.2 R, --SR, --NRR', --OC.dbd.ONHR, --OC.dbd.OOR, --OSiRR'O and --OC.dbd.OR; and where R and R' may be hydrogen or any of a wide variety of organic substituents, including substituted or unsubstituted alkyl, aryl, substitutents. The photoactive component may also include a photoactive monomeric compound which contains groups having the 2,6-dinitro structure (1) and/or the 2,5-dinitro structure (2) set out above. The dimethyl aniline component includes a N,N-dimethyl aniline compound.