The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2000
Filed:
Mar. 23, 1998
Hang Thanh Pham, Amherst, NY (US);
Rajiv R Singh, Getzville, NY (US);
Addison M Smith, Amherst, NY (US);
David P Wilson, East Amherst, NY (US);
Raymond Hilton Thomas, Pendleton, NY (US);
Gustavo Cerri, Parsippany, NJ (US);
AlliedSignal Inc., Morristown, NJ (US);
Abstract
The invention relates to an improvement in a process in which chlorine and difluoromethane are present in a distillation column, for example, a fluorination reaction. By controlling the chlorine feed such that the concentration of chlorine relative to difluoromethane in the distillation column is maintained below about 22 weight percent (the flammability threshold for chlorine in a mixture of difluoromethane and chlorine), formation of a flammable difluoromethane/chlorine mixture may be minimized or avoided. The invention is particularly useful in a process for the preparation of difluoromethane wherein at least one distillation column separates difluoromethane from unreacted starting materials such as methylene chloride, hydrogen fluoride and monochloromonofluoromethane.