The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2000

Filed:

May. 27, 1997
Applicant:
Inventors:

Donald O Patten, Jr, Sterling, MA (US);

Matthew A Simpson, Sudbury, MA (US);

Henry Windischmann, Northboro, MA (US);

Michael S Heuser, Foothill Ranch, CA (US);

William A Quirk, Lake Forest, CA (US);

Stephen M Jaffe, Lake Forest, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; F28F / ;
U.S. Cl.
CPC ...
118724 ; 118728 ; 118500 ; 165 801 ;
Abstract

An apparatus for depositing synthetic diamond on a surface of a substrate includes a deposition chamber and a cooling block having a surface in the deposition chamber that is cooled by heat exchange. The substrate is supported from the cooling block so that the bottom surface of the substrate is spaced from the cooling block surface by a gap, and a gas is provided in the deposition chamber and in the gap, the gas comprising at least 30 percent hydrogen gas. A plasma deposition system forms in the chamber a plasma containing hydrogen gas and a hydrocarbon gas for depositing synthetic diamond on the top surface of the substrate.


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