The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2000
Filed:
Apr. 16, 1998
Nobuyoshi Tanaka, Tokyo, JP;
Kenji Saito, Utsunomiya, JP;
Hideki Ina, Utsunomiya, JP;
Yoshiyuki Sekine, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for exposing a pattern on a device material includes a holder for chucking and holding a silicon ball, a spherical reticle on which a hologram of a circuit pattern to be exposed is formed, a light source, a focusing optical system for focusing light emitted by the light source on a first position, and an elliptic mirror having a first focal point at the first position and a second focal point at the central position of the silicon ball (reticle). The center of the reticle coincides with the center of the silicon ball.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile