The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2000
Filed:
Jun. 12, 1997
Applicant:
Inventors:
Yutaka Saitoh, Chiba, JP;
Jun Osanai, Chiba, JP;
Assignee:
Seiko Instruments Inc., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
257345 ; 257344 ;
Abstract
An improvement of a resistance to electrostatic discharge of a semiconductor integrated circuit device is aimed. An IC having a high ESD immunity is realized by causing a surface concentration of N type impurities in a drain area of an N-channel type MOS transistor to be more than 5 E 18/cm.sup.3 in maximum in the direction of gate electrode of a gate electrode terminal and to have a monotonous concentration profile in which there is no kink in a portion less than 5 E 18/cm.sup.3 in the surface direction.