The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2000
Filed:
Apr. 24, 1998
Applicant:
Inventors:
Masatomo Terakado, Odawara, JP;
Youichi Inomata, Odawara, JP;
Yotsuo Yahisa, Odawara, JP;
Akira Ishikawa, Kodaira, JP;
Kiyoshi Akamatsu, Yokohama, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
4286 / ; 4286 / ; 4286 / ; 428900 ;
Abstract
A non-ferromagnetic metal thin film is formed on a non-ferromagnetic substrate such as a glass substrate. A target principally containing an intermetallic compound is sputtered to form a fine structure having discrete bumps provided on the surface of the substrate. In addition, ring bumps different from the bumps of the intermetallic compound are formed on a contact start/stop zone by a laser or other means, thus completing a magnetic recording medium.