The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2000
Filed:
Apr. 06, 1998
Xi Chu, Fremont, CA (US);
Other;
Abstract
A method for cleaning the surface of magnetic disks prior to the deposition of a metal layer on the magnetic disk. The method includes the steps of first, placing a magnetic disk into a magnetron assisted DC plasma chamber. The plasma chamber includes a vacuum chamber, one or more targets, one or more magnets, a noble gas source, a target power supply, and a DC bias power supply. Next, a noble gas, for example argon, is introduced into the vacuum chamber via the noble gas source, and a DC glow discharge is generated in the vacuum chamber by supplying power to the one or more targets using the target power supply. Finally, the magnetic disk is etched when a negative voltage is applied to the magnetic disk using the DC bias power supply.