The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 2000

Filed:

Dec. 30, 1998
Applicant:
Inventor:

Masayuki Kamegawa, Nara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
356 32 ; 73800 ;
Abstract

A reference line mark for an optical extensometer of the invention has a mark main body with a boundary shape, in which a reflectance of light is different from other portions. The boundary shape is arranged such that when the mark main body is integrated in a direction perpendicular to the deformation direction under the condition that the mark is attached to a test piece, results of the integration constitute an isosceles triangle having a base in a deformation direction of the test piece. Thus, data points for obtaining edge portions of the mark can be increased, and error-free approximation can be available. Elongation of the test piece can be measured with high accuracy at high computing speed.


Find Patent Forward Citations

Kamegawa, Masayuki. (2000). Optical extensometer and reference line mark therefor (U.S. Patent No. 6094259). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6094259

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…