The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2000
Filed:
Jun. 26, 1997
General Electric Company, Waukesha, WI (US);
Abstract
New methods of generating optimal inversion pulses and adiabatic pulses in magnetic resonance imaging are disclosed. Trajectories, maximum sweep rates, and velocity profiles are used in defining an optimal pulse, over support regions. Adiabatic pulses are optimized by using the trajectory as a constraint of optimization, but selecting trajectories with velocity profiles, without using the adiabatic condition as a constraint for optimizing the velocity profile. A method or inverting MR spins substantially, independently of the pulse duration, by selecting a transition width between 1.4 and 1.9 and dividing that width by the pulse duration is disclosed; and A new method of inverting adiabatic, MR, amplitude modulated spins, with a trajectory defined by sin .alpha./cos .alpha., where .alpha.<0.9 and at least 50% of the trajectory is outside, in a z-x rotating frame of reference that rotates at the instantaneous frequency of the RF pulse is also taught.