The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2000
Filed:
Oct. 01, 1999
Kazuyoshi Sugihara, Tokyo, JP;
Hiromi Niiyama, Tokyo, JP;
Shunko Magoshi, Tokyo, JP;
Atsushi Ando, Tokyo, JP;
Tetsuro Nakasugi, Tokyo, JP;
Shinji Sato, Tokyo, JP;
Yumi Watanabe, Tokyo, JP;
Yosimitu Kato, Tokyo, JP;
Toru Shibata, Tokyo, JP;
Katsuya Okumura, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A rough pattern exceeding the resolution limit of light exposure is formed by light resolution. A fine pattern not exceeding the resolution limit of light exposure is formed by charge-beam exposure. Combining the rough pattern and the fine pattern produces a desired pattern. The sharing of the work between light exposure and charge-beam exposure exhibits the high throughput of light exposure and the excellent resolving power of charge-beam exposure.