The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2000
Filed:
Sep. 04, 1997
Ruriko Takano, Tokyo, JP;
Tsuneyuki Abe, Tokyo, JP;
Namiko Kobayashi, Tokyo, JP;
Etsu Nishijima, Tokyo, JP;
Yukie Shigemi, Tokyo, JP;
Setsuko Suzuki, Tokyo, JP;
Shiseido Company, Ltd., Tokyo, JP;
Abstract
A method for classifying a face in which facial features are analyzed so that the face is appropriately classified or recognized in order to facilitate an exact and easy creation of an image produced by applying makeup. A first index represents one of a length of the face and a configuration of formational elements of the face, the formational elements including an eye, an eyebrow, a mouth and a nose. A second index represents one of a contour of the face and a contour of each of the formational elements of the face. A face is classified into one of groups of features each of which provides similar impressions by using the first index and the second index.