The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2000
Filed:
Apr. 17, 1998
Masahiro Mimasaka, Kyoto, JP;
Koji Uchitani, Kyoto, JP;
Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;
Abstract
The present invention provides a developing apparatus and a developing method which make it possible to uniformly develop a photosensitive film which is formed on a substrate at a high throughput. A substrate processing apparatus which comprises such a developing apparatus and a developing method is also realized. During developing processing, a substrate is held still by a substrate holding portion. A developing solution dispensing nozzle moves over the substrate, linearly from a position off and on one side of the substrate to a position off and on the other side of the substrate in a scanning direction (A), and supplies a developing solution onto the substrate. After the developing solution dispensing nozzle moves in the scanning direction (A), a substrate transport apparatus replaces the substrate which is held by the substrate holding portion with another substrate. Following this, the developing solution dispensing nozzle moves over the substrate, linearly from the position off and on the other side of the substrate to the position off and on the one side of the substrate in an opposite scanning direction (D) to the scanning direction (A), and supplies the developing solution onto the substrate.