The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2000
Filed:
Jun. 09, 1998
Applicant:
Inventors:
Soichi Owa, Tokyo, JP;
Tomoko Ohtsuki, Tokyo, JP;
Assignee:
Nikon Corporation, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 97 ; 372 21 ; 372-5 ; 372 22 ;
Abstract
An ultraviolet laser apparatus which generates laser light at 193 nm to 213 nm with high temporal and spatial coherence and relatively high power is disclosed. The UV laser apparatus provides a light source for an exposure device for optical lithography and an aberration measurement interferometer that measures lens wave front aberration. The laser apparatus disclosed herein comprises two lasers having laser resonators that are coincident along a portion of their respective optical paths. A nonlinear optical crystal is located along the shared optical path portion for sum frequency generation of the light of the respective lasers.