The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2000
Filed:
Nov. 21, 1997
Roy Lee Adler, Chappaqua, NY (US);
Gerhard Robert Thompson, Wappingers Falls, NY (US);
Charles P Tresser, Mamaroneck, NY (US);
Chai Wah Wu, Ossining, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and apparatus for halftoning utilizes a truly aperiodic mask with memory requirements much smaller than the mask itself. The mask is constructed of several smaller compatible masks and a selector which selects between the smaller masks. In this way the computation of a large aperiodic mask is replaced by the computation of several much smaller masks. Using this technique, watermarks may be embedded for encrypting information in such a way that the quality of the image is not compromised.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile