The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2000
Filed:
Mar. 03, 1998
Applicant:
Inventors:
Ronald J Tonucci, Waldorf, MD (US);
Douglas H Pearson, Laurel, MD (US);
Assignee:
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C / ;
U.S. Cl.
CPC ...
438758 ; 438943 ; 438945 ; 438947 ; 216 54 ;
Abstract
The present invention is a process for making complex structures with nanoscale resolution in parallel by placing an NCG replica-based mask (or other suitable mask) in close proximity to a substrate and controlling, with nanoscale accuracy and precision, the relative movement of the mask and substrate while sequentially or concurrently carrying out a patterning process or processes. Another aspect of the invention is a diamond film with submicron and/or nanoscale features, that can be made by the method of the invention.