The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2000
Filed:
May. 06, 1999
Applicant:
Inventor:
Jau-Hone Lu, Hsinchu Hsien, TW;
Assignee:
United Integrated Circuits Corp., Hsinchu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438638 ; 438639 ; 438666 ; 438668 ;
Abstract
An improved dual damascene process is provided. By a spacer formed on sidewalls of an oxide layer, the method can make a via plug and a metal layer serving as an interconnect simultaneously form in a self-aligned process. Therefore, it can successfully avoid misalignment while forming a via plug and an interconnect.