The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2000

Filed:

May. 19, 1998
Applicant:
Inventors:

Timothy J Renk, Albuquerque, NM (US);

Neil R Sorensen, Albuquerque, NM (US);

Donna Cowell Senft, Albuquerque, NM (US);

Rudolph G Buchheit, Jr, Columbus, OH (US);

Michael O Thompson, Ithaca, NY (US);

Kenneth S Grabowski, Alexandria, VA (US);

Assignee:

Sandia Corporation, Albuquerque, NM (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
2041921 ; 4273765 ; 4273766 ; 4273767 ; 4273768 ; 427533 ; 427535 ; 427539 ; 427551 ; 427552 ; 427553 ; 427555 ; 427556 ; 427559 ; 4273722 ; 427331 ; 427375 ; 4273761 ; 4273762 ; 4273763 ; 4273764 ; 2041921 ; 20415715 ; 25049221 ; 2504923 ; 2504921 ; 148565 ; 1562722 ; 1562726 ; 438485 ; 438535 ; 438557 ;
Abstract

The present invention provides a surface modification method that provides beneficial changes in surface properties, can modify a surface to a greater depth than previous methods, and that is suitable for industrial application. The present method comprises applying a thin-film coating to a surface of a substrate, then subjecting the coated surface to an ion beam. The ion beam power pulse heats the coated surface, leading to alloying between the material in the coating and the material of the substrate. Rapid cooling of the alloyed layer after an ion beam pulse can lead to formation of metastable alloys and microstructures not accessible by conventional alloying methods or intense ion beam treatment of the substrate alone.


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