The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 2000

Filed:

Oct. 06, 1997
Applicant:
Inventors:

Richard A Kanishak, Danville, CA (US);

Kirk A Martin, Aptos, CA (US);

Assignee:

Nisene Technology Group, Santa Cruz, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156345 ; 118726 ;
Abstract

A vapor generation system includes a supply of liquid; an inert gas stream; an aspirator for aspirating the liquid into the gas stream; a heater for heating the gas stream upstream from the aspirator to a temperature such that aspirated liquid is vaporized in the aspirator to form an inert gas and liquid vaporous mixture; and a mixture outlet for flowing the vaporous mixture against a surface of a workpiece. In a particular application a nitrogen gas stream is heated in a heat exchanger and flows through an aspirator/evaporator to vaporize pumped pulses of hydrofluoric acid in the heated flow stream. The resultant vaporous mixture forms a suitable vaporous etchant for removing silicon dioxide contaminates from a conveyor belt which is employed to convey semiconductor wafers through a chemical vapor deposition processing chamber.


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