The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2000
Filed:
Aug. 28, 1998
Applicant:
Inventors:
Chang Auck Choi, Daejon-Shi, KR;
Jong Hyun Lee, Daejon-Shi, KR;
Won Ick Jang, Daejon-Shi, KR;
Yong Il Lee, Daejon-Shi, KR;
Jong Tae Baek, Daejon-Shi, KR;
Bo Woo Kim, Daejon-Shi, KR;
Assignee:
Electronics and Telecommunications Research Institute, Daejon-Shi, KR;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03F / ;
U.S. Cl.
CPC ...
355 71 ; 355 53 ; 430-5 ;
Abstract
This invention discloses a programmable mask for exposure apparatus which is formed by an integrated pixels of a micro-devices which shut or open a light by an electrical signal. This invention provides a photolithography method by projecting on a silicon wafer a directly designed circuit pattern which is made on a programmable mask fabricated by an integration of many a micro optical shutter devices as a pixels.