The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2000

Filed:

Dec. 21, 1998
Applicant:
Inventors:

Robert B Davies, Tempe, AZ (US);

Chandrasekhara Sudhama, Phoenix, AZ (US);

Assignee:

Motorola, Inc., Schaumburg, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
257345 ; 257349 ; 257404 ; 438207 ; 438217 ; 438289 ;
Abstract

A graded-channel semiconductor device (10) is formed in a pedestal (12). The pedestal (12) is formed on a substrate (11) and improves the electrical characteristics of the device (10) compared to conventional device structures. The pedestal (12) has sides (13) that are bordered by a dielectric layer (24) to provide electrical isolation. The semiconductor device (10) includes a drain extension region (101) that extend from a drain region (44) to a gate structure (20). The semiconductor device (10) also has a conductive structure (105) that is adjacent to the gate structure (20).


Find Patent Forward Citations

Davies, Robert. (2000). Semiconductor device and method of making (U.S. Patent No. 6084269). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6084269

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…