The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2000
Filed:
Feb. 05, 1998
Seung-kun Lee, Suwon, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A robot for transporting a plurality of wafers from one processing station to another in a batch-type semiconductor device manufacturing process includes a chuck for holding wafers, a spray nozzle for spraying inert gas on the wafers in order to cover them and thereby prevent their contact with the surrounding air, and a supply line for connecting the spray nozzle and an inert gas supply source. The spray nozzle has a plurality of spray openings spaced apart at uniform intervals. The inert gas is sprayed over the wafers from a nozzle that moves with the robot, thereby creating an inert gas environment around the wafers. Accordingly, as the robot moves, water or other particles adhering to the wafers do not contact the surrounding air moving relative thereto. Hence, marks are prevented from being produced on the wafers.