The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2000
Filed:
May. 15, 1998
George Meng-Jaw Cherng, Hsinchu, TW;
Vanguard International Semiconductor Corporation, Hsin-Chu, TW;
Abstract
A new and improved method for fabricating planarized isolation trenches, wherein erosion of insulating material at the edges of trenches is surpressed without sacrificing a minimal width of the isolation trench, has been developed. The process fabricates sidewall spacers before etching the isolation trench into the semiconductor substrate. After filling the etched trench with insulating material and plartarization of the insulating material, the sidewall spacers protect the insulating material filling the trench and prevent the formation of 'divots' at the edges of the trench. Since the spacers are formed prior to the etching of the trench in the semiconductor substrate, a minimal width of the isolation trench can be maintained and less area is required for the isolation trench.