The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2000
Filed:
Feb. 19, 1998
Osamu Sugiyama, Tokorozawa, JP;
Yukio Miya, Tokorozawa, JP;
Ryota Koike, Tokorozawa, JP;
Takashi Toida, Tokorozawa, JP;
Citizen Watch Co., Ltd., Tokyo, JP;
Abstract
A method of forming films over an insulating material is provided whereby an underlayer film having electric conductivity is formed on the surface of the insulating material constituting a base member, and a hard carbon film is formed over the underlayer film so that the surface electrical resistance value of the hard carbon film can be controlled so as not to cause the surface thereof to be charged with static electricity by varying an electrical resistance value of the underlayer film. In the case where the underlayer film is formed of a metal film composed of titanium, chromium, tungsten, or the like, the resistance value thereof can be changed by varying the thickness of the metal film. In the case where the underlayer film is formed of a semiconductor film composed of silicon, germanium, or the like, the resistance value thereof can be changed by varying the thickness of the semiconductor film, or the concentration of an impurity added thereto.