The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2000
Filed:
Dec. 29, 1997
Robert S Moshrefzadeh, Oakdale, MN (US);
Richard J Pokorny, Maplewood, MN (US);
Raghunath Padiyath, Woodbury, MN (US);
Wayne M Wirth, North St. Paul, MN (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
A method of selectively patterning a structured substrate without using a mask is disclosed. The method includes the steps of providing a surface having a plurality of protrusions, coating the surface with a filler material thick enough so that the protrusions are covered, and planarizing the filler coating. The filler material is thereafter partially removed in a uniform fashion to expose only those portions of the protrusions to be modified. After modifying the protrusions by, for example, deposition or etching, the remaining filler material may be removed, resulting in a structured substrate selectively modified or patterned at its protrusions.