The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2000

Filed:

Mar. 18, 1999
Applicant:
Inventors:

Petar R Dvornic, Midland, MI (US);

Agnes M deLeuze-Jallouli, Clearwater, FL (US);

Michael James Owen, Midland, MI (US);

Susan Victoria Perz, Essexville, MI (US);

Assignees:

Dow Corning Corporation, Midland, MI (US);

Dendritech, Incorporated, Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08L / ;
U.S. Cl.
CPC ...
424D / ; 525424 ; 525426 ; 525430 ; 525431 ; 525474 ; 525487 ; 525417 ;
Abstract

Higher generation radially layered copolymeric dendrimers having a hydrophilic poly(amidoamine) or a hydrophilic poly(propyleneimine) interior and a hydrophobic organosilicon exterior are prepared by first reacting a hydrophilic dendrimer having --NH.sub.2 surface groups with an organosilicon compound, and then hydrosilating the resulting copolymeric dendrimer with another organosilicon compound in the presence of a noble metal catalyst. In an alternate embodiment, the radially layered copolymeric dendrimers are prepared by reacting a hydrophilic dendrimer having --NH.sub.2 surface groups directly with an organosilicon dendron or organosilicon hyperbranched polymer.


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