The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2000

Filed:

Mar. 10, 1998
Applicant:
Inventors:

Edward W Morton, Turnersville, NJ (US);

Robert Andrukaitis, Mantua, NJ (US);

Joseph Scarpinato, Williamstown, NJ (US);

Assignees:

Sony Corporation, Tokyo, JP;

Sony Electronics, Park Ridge, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C / ; G01N / ; G01N / ; G01N / ; G05B / ;
U.S. Cl.
CPC ...
118 58 ; 118688 ; 118712 ; 73 232 ; 7315 / ; 374 53 ; 422105 ; 436 55 ; 436 85 ;
Abstract

The present invention provides a system and method for thermally curing polymeric coated substrates by effective drying of solvents used in the production of the coated component. A feedback system coupled to a heating apparatus is comprised of one or more gas sensors internal or external to the heating apparatus to provide monitoring of the quantity of solvent gases being generated. The present invention allows the curing process to be precisely controlled, where, for example, a predetermined concentration of solvent gases input to the gas sensor can trigger the heating process to be stopped or to provide for a controlled cool down period for curing of the photoresist substrate. A controller coupled between the gas sensor and the heating apparatus may also contain temperature and/or time controls for varying the output of the heating apparatus in response to indications from the gas sensor. The system of the present invention assures production of stable photoresist coatings and also minimizes the processing time needed to properly cure the polymeric coated substrates.


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