The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2000
Filed:
May. 17, 1999
Applicant:
Inventors:
Andrew J Black, San Antonio, TX (US);
Landon Vines, San Antonio, TX (US);
Assignee:
VLSI Technology, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451 53 ; 451 41 ; 451398 ; 451287 ;
Abstract
The temperature of a wafer is controlled during a chemical mechanical polishing process. Fluid containment is provided on a wafer backing plate in contact with the wafer during the chemical mechanical polishing process. Transportation of fluid is provided to and from the fluid containment during the chemical mechanical polishing process. Temperature of the fluid is controlled in order to control temperature on the wafer during the chemical mechanical polishing process.