The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2000
Filed:
Feb. 28, 1995
Dietmar Kollhof, Ilmenau, DE;
Joachim Wienecke, Jena, DE;
Karl-Heinz Franke, Ilmenau, DE;
Michael Graef, Jena, DE;
Heiko Kempe, Geraberg, DE;
Jenoptik Technologie GmbH, Jena, DE;
Abstract
The object of a method for detecting defects in the inspection of structured surfaces is to ensure a detection of defects which is not dependent on the number of structuring planes and includes structure features in real-time operation for separating defects from good structures. From image point classification in which zones of a recorded image which have similar image point features are assembled, a gray-value intermediate image containing edge structures and corner structures is generated from the image and the behavior of the image point features of every image point in the intermediate image is analyzed with respect to its neighboring image points. The method is used predominantly in statistical process control in the production process of masks, LCD's, printed circuit boards and semiconductor wafers.