The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2000
Filed:
Jun. 12, 1998
Koichi Takeuchi, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A mask pattern including an auxiliary pattern for improving printing accuracy is easily formed. A process of making the auxiliary pattern includes the steps of: providing an auxiliary pattern forbidden region around an original pattern based on the original pattern formed by an original pattern generating means (step S1); providing an auxiliary pattern formation region around the auxiliary pattern forbidden region based on the auxiliary pattern forbidden region provided in step S1 (step S2); and forming an auxiliary pattern of specific width based on the auxiliary pattern formation region provided in step S2 (step S3). Such formation of the auxiliary pattern prevents neighboring two traces of auxiliary pattern from touching or overlapping each other, for example. An auxiliary pattern is easily formed even if an original pattern is a complicated one without repeatability.