The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2000
Filed:
Jun. 24, 1997
Applicant:
Inventors:
Assignee:
Balzers Aktiengesellschaft, , DE;
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427-8 ; 137551 ; 4272481 ; 42725523 ; 427569 ; 427582 ; 427585 ;
Abstract
A method for monitoring the actual flow of a gas into a vacuum facility, which flow of gas resulting from setting a desired flow of gas by means of at least one adjustable mass flow controller, interconnected between said facility and a pressurized reservoir arrangement for said gas.
Schmitt, Jacques. (2000). Method for monitoring the flow of a gas into a vacuum reactor (U.S. Patent No. 6074691). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6074691
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