The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2000
Filed:
Feb. 27, 1998
Applicant:
Inventors:
Assignee:
Tosoh Corporation, Shinnanyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451 37 ; 451 38 ; 451 39 ;
Abstract
The surface to be sputtered of a sputtering target is blasted with a blasting material in the form of a finely divided powder having particle diameters falling within the range of 10 to 500 .mu.m to remove impurities staining the surface to be sputtered. This blasting treatment is suitable especially for a sputtering surface having a raised portion thereon. Preferably the blasting treatment is effected in two stages: in the first stage, a blasting material powder with particle diameters of 50 to 500 .mu.m is used and, in the second stage, a blasting material powder with particle diameters of 10 to 110 .mu.m is used. The blast-treated surface has a uniform, isotropic and reduced surface roughness.