The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2000
Filed:
Dec. 04, 1998
Electronics and Telecommunications Research Insitute, Taejon, KR;
Abstract
The object of the present invention is to provide a RF induction plasma source generating apparatus which generates a stabilized plasma and sustains the stabilized plasma by maintaining the plasma pressure from several hundreds Torr to several thousands Torr with attachment a buffer nozzle cap, upper metallic blocking films and lower metallic blocking films to a nozzle cap, plasma tube and RF induction coils, respectively for separating the plasma source generating apparatus from the chamber. To accomplish the object of the invention, the plasma source generating apparatus comprising PBN tube, RF induction coils, a nozzle, and a nozzle cap is characterized by a buffer nozzle cap for locating between the nozzle cap and the plasma tube and modulating the flow of the gas to modulate the difference between the chamber pressure and the plasma pressure; sealing films formed by sealing the lips of the buffer nozzle cap, the nozzle cap and the plasma tube for preventing the leakage of gas; and upper blocking films and lower blocking films for blocking the spread out of the RF electric field induced in the RF induction coils and converging the plasma source.