The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2000
Filed:
Jul. 30, 1997
Applicant:
Inventor:
Roger L Verkuil, Wappinger Falls, NY (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R / ;
U.S. Cl.
CPC ...
324750 ;
Abstract
A method for measuring junction leakage in a semiconductor product wafer while applying varying light to the wafer. A surface photovoltage characteristic for the wafer and an eddy current characteristic for the wafer in response to the light are measured. A junction leakage characteristic for at least one of junction types is determined by simultaneously measuring the surface photovoltage and the induced eddy current characteristics in response to a light flash.
Verkuil, Roger. (2000). Product wafer junction leakage measurement using light and eddy current (U.S. Patent No. 6072320). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6072320
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