The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2000
Filed:
Mar. 17, 1995
Hiroyuki Yoshimori, Kanagawa Pref., JP;
Carlos A Paz De Araujo, Colorado Springs, CO (US);
Takeshi Ito, Colorado Springs, CO (US);
Michael C Scott, Colorado Springs, CO (US);
Larry D McMillan, Colorado Springs, CO (US);
Symetrix Corporation, Colorado Springs, CO (US);
Olympus Optical Co., Ltd., , JP;
Abstract
A liquid precursor containing a metal is applied to a substrate, RTP baked, and annealed to form a layered superlattice material. Special polyoxyalkylated precursor solutions are designed to optimize polarizability of the corresponding metal oxide materials by adding dopants including stoichiometric excess amounts of bismuth and tantalum. The RTP baking process is especially beneficial in optimizing the polarizability of the resultant metal oxide.