The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2000
Filed:
Jan. 21, 1998
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A heat development image forming process comprises steps of: imagewise exposing to light a heat developable light-sensitive material comprising a support, a light-sensitive layer and a non-light-sensitive layer, and then heating the light-sensitive material. The light-sensitive layer or the non-light-sensitive layer contains a heptamethine cyanine dye represented by the formula (I): in which Z.sup.1 is --CR.sup.11 R.sup.12 --, --O--, --S-- or --NR.sup.13 --; Z.sup.2 is --CR.sup.21 R.sup.22 --, --O--, --S-- or --NR.sup.23 --; each of R.sup.1 and R.sup.2 independently is an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aralkyl group or a substituted aralkyl group; R.sup.3 is hydrogen, a halogen atom, an alkyl group, a substituted alkyl group, a cycloalkyl group, a substituted cycloalkyl group, an aryl group, a substituted aryl group, a heterocyclic group, a substituted heterocyclic group, cyano, --SO.sub.2 R.sup.31, --OR.sup.32, --SR.sup.33 or --NR.sup.34 R.sup.35 ; X is an anion; and n is 0 or 1.