The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2000
Filed:
Jan. 12, 1999
Satoru Mihara, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A carbon-containing film, which is made of a carbon-containing material, is adhered to the inner wall of a chamber. A semiconductor substrate is arranged in the chamber whose inner wall has the carbon-containing film adhered thereto. A plasma of a process gas which contains a rare gas is generated in the chamber, and such an electric field as to cause ions contained in the plasma to be attracted to a surface of the semiconductor substrate is applied in order to etch a part of the surface layer of the semiconductor substrate. During the etching, a film which contains a constituent or constituents of an etched film adheres to the surface of the carbon-containing film. The carbon-containing film prevents the peeling off of such an adhering film from the inner wall of the chamber, thereby reducing the generation of particles.