The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2000
Filed:
Jul. 10, 1998
Ram Ramamurthi, Allen, TX (US);
Nobou Takeda, Sendai, JP;
Ball Semiconductor, Inc., Allen, TX (US);
Abstract
An apparatus and a method for producing a mask, which was derived using two-dimensional design tools, for imparting circuit designs directly on a three-dimensional surface. The method for creating the mask includes the steps of creating a two dimensional design with at least one element, establishing a location coordinate for the element using a two-dimensional coordinate system, converting the location coordinate for the element into a spacial coordinate for the element using a three-dimensional spacial coordinate system, converting the spacial coordinate for the element into a positional coordinate, and generating the mask using the positional coordinate. The apparatus for implementing three-dimensional designs using a mask, which is generated from a two-dimensional design, includes a light source and an elliptical mirror. The elliptical mirror has two focal points so that the elliptical mirror can focus a beam of light onto the three-dimensional surface.